Experimental and theoretical studies of Si-Cl and Ge-Cl σ-bond activation reactions by iridium-hydride

被引：29

作者：

Kameo, H. ^{[1
]}

Ikeda, K. ^{[1
]}

Sakaki, S. ^{[2
]}

Takemoto, S. ^{[1
]}

Nakazawa, H. ^{[3
]}

Matsuzaka, H. ^{[1
]}

机构：

[1] Osaka Prefecture Univ, Grad Sch Sci, Dept Chem, Naka Ku, Gakuen Cho 1-1, Sakai, Osaka 5998531, Japan

[2] Kyoto Univ, Fukui Inst Fundamental Chem, Sakyo Ku, Takano Nishihiraki Cho 34-4, Kyoto 6068103, Japan

[3] Osaka City Univ, Grad Sch Sci, Dept Chem, Sumiyoshi Ku, Sugimoto 3-3-138, Osaka 5588585, Japan

来源：

DALTON TRANSACTIONS | 2016年 / 45卷 / 18期

基金：

日本学术振兴会;

关键词：

OXIDATIVE ADDITION; SILYL HALIDES; H ACTIVATION; COMPLEXES BEARING; RHODIUM COMPLEXES; METAL INSERTION; SILICON-HALOGEN; MILD CONDITIONS; METHYL-IODIDE; AB-INITIO;

D O I：

10.1039/c6dt00003g

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

We report the iridium hydride-mediated Si-Cl and Ge-Cl sigma-bond activation in a low-polarity toluene solution owing to diphosphine-chelation, in which the Si-Cl and Ge-Cl sigma-bonds are readily cleaved through an S(N)2-type pathway via the formation of a free chloride anion.

引用

页码：7570 / 7580

页数：11

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