Micro-nanostructured interfaces fabricated by the use of inorganic block copolymer micellar monolayers as negative resist for electron-beam lithography

被引：144

作者：

Glass, R

Arnold, M

Blümmel, J

Küller, A

Möller, M

Spatz, JP ^{[1
]}

机构：

[1] Heidelberg Univ, Inst Phys Chem Biophys Chem, INF, D-69120 Heidelberg, Germany

[2] Rhein Westfal TH Aachen, Deutsches Woll Forsch Inst, D-52062 Aachen, Germany

来源：

ADVANCED FUNCTIONAL MATERIALS | 2003年 / 13卷 / 07期

关键词：

D O I：

10.1002/adfm.200304331

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

This paper introduces an approach where the match of two different length scales, ie., pattern from self-assembly of block copolymer micelles (<100 nm and electron-beam (e-beam writing (>50 nm), allow the grouping of nanometer-sized gold clusters in very small numbers in even aperiodic pattern and separation of these groups at length scales that are not accessible by pure self-assembly. Thus, we could demonstrate the grouping of Au nanoclusters in different geometries such as squares, rings, or spheres.

引用

页码：569 / 575

页数：7

共 32 条

[1] Surface-induced structure formation of polymer blends on patterned substrates [J].