Study on the electronic structure and optical properties of TiN films based on the first-principle

被引:8
作者
Song, Huijin [1 ]
Gu, Peng [2 ]
Zhu, Xinghua [2 ]
Yan, Qiang [1 ]
Yang, Dingyu [2 ]
机构
[1] Chengdu Univ, Coll Mech Engn, Chengdu 610106, Sichuan, Peoples R China
[2] Chengdu Univ Informat Technol, Coll Optoelect Technol, Chengdu 610225, Sichuan, Peoples R China
关键词
TiN thin films; First-principle; Optical properties; Energy band structure; Total density of states; THIN-FILMS; TEMPERATURE;
D O I
10.1016/j.physb.2018.05.008
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Base on the first-principles, the energy band and optical properties of TiN thin films were modeled by the materials studio (MS) programm. The energy band, total density of states (DOS), dielectric function, absorption and reflectivity of TiN were studied. The results suggested that the Fermi energy (E-F) passes through the energy band with dense distribution of energy levels, moreover, the total density of states crosses the E-F, suggested that TiN belongs to metalloid, and determined by electronics in Ti-3d state. Meanwhile, the structure of energy band was affected by pressure, but the influence of temperatures is weak. The reflectivity of TiN to red light (1.63 eV to 1.97 eV) is lower than that of blue light (2.53 eV to 2.75 eV). Moreover, TiN has a higher reflectance in the infrared region, and showed translucent in the visible light region and the static permittivity of TiN is about 39.24 F/m.
引用
收藏
页码:197 / 202
页数:6
相关论文
共 21 条
[1]   The role of droplets on the cavitation erosion damage of TiN coatings produced with cathodic arc physical vapor deposition [J].
Azar, Golnaz Taghavi Pourian ;
Yelkarasi, Cagatay ;
Urgen, Mustafa .
SURFACE & COATINGS TECHNOLOGY, 2017, 322 :211-217
[2]   Influence of correlation and temperature on the electronic structure of bulk and thin film GdN [J].
Bhattacharjee, S ;
Jaya, SM .
EUROPEAN PHYSICAL JOURNAL B, 2006, 49 (03) :305-311
[3]   The influence of hydrostatic pressure on the electronic structure and optical properties of tin dioxide: A first-principle study [J].
Cai, Lu-Gang ;
Liu, Fa-Min ;
Zhang, Dian ;
Zhong, Wen-Wu .
PHYSICA B-CONDENSED MATTER, 2013, 408 :73-78
[4]   Influence of the temperature of film formation on the electronic structure of oxide films formed on 304 stainless steel [J].
Ferreira, MGS ;
Hakiki, NE ;
Goodlet, G ;
Faty, S ;
Simoes, AMP ;
Belo, MD .
ELECTROCHIMICA ACTA, 2001, 46 (24-25) :3767-3776
[5]   Microstructure and high temperature oxidation resistance of in-situ synthesized TiN/Ti3Al intermetallic composite coatings on Ti6Al4V alloy by laser cladding process [J].
Liu, Hongxi ;
Zhang, Xiaowei ;
Jiang, Yehua ;
Zhou, Rong .
JOURNAL OF ALLOYS AND COMPOUNDS, 2016, 670 :268-274
[6]   Effects of Substrate Bias on the Hardness and Resistivity of Reactively Sputtered TaN and TiN Thin Films [J].
Lu, Junqing ;
Arshi, Nishat .
JOM, 2016, 68 (06) :1634-1639
[7]   Investigation of fracture properties of magnetron-sputtered TiN films by means of a FIB-based cantilever bending technique [J].
Massl, S. ;
Thomma, W. ;
Keckes, J. ;
Pippan, R. .
ACTA MATERIALIA, 2009, 57 (06) :1768-1776
[8]   Cu diffusion in single-crystal and polycrystalline TiN barrier layers: A high-resolution experimental study supported by first-principles calculations [J].
Muehlbacher, Marlene ;
Bochkarev, Anton S. ;
Mendez-Martin, Francisca ;
Sartory, Bernhard ;
Chitu, Livia ;
Popov, Maxim N. ;
Puschnig, Peter ;
Spitaler, Juergen ;
Ding, Hong ;
Schalk, Nina ;
Lu, Jun ;
Hultman, Lars ;
Mitterer, Christian .
JOURNAL OF APPLIED PHYSICS, 2015, 118 (08)
[9]   Structural, mechanical, and electrical properties of cubic boron nitride thin films deposited by magnetically enhanced plasma ion plating method [J].
Noma, Masao ;
Eriguchi, Koji ;
Takao, Yoshinori ;
Terayama, Nobuyuki ;
Ono, Kouichi .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (03)
[10]   Low friction CrN/TiN multilayer coatings prepared by a hybrid high power impulse magnetron sputtering/DC magnetron sputtering deposition technique [J].
Paulitsch, J. ;
Schenkel, M. ;
Schintlmeister, A. ;
Hutter, H. ;
Mayrhofer, P. H. .
THIN SOLID FILMS, 2010, 518 (19) :5553-5557