High-aspect-ratio structures for MEMS

被引：6

作者：

Pang, SW ^{[1
]}

机构：

[1] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA

来源：

MRS BULLETIN | 2001年 / 26卷 / 04期

关键词：

D O I：

10.1557/mrs2001.67

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：307 / 308

页数：2

共 14 条

[1] Surface micromachining for microelectromechanical systems [J].

Bustillo, JM ;

Howe, RT ;

Muller, RS .

PROCEEDINGS OF THE IEEE, 1998, 86 (08) :1552-1574

[2] HIGH-ASPECT-RATIO POLYIMIDE ETCHING USING AN OXYGEN PLASMA GENERATED BY ELECTRON-CYCLOTRON-RESONANCE SOURCE [J].

JUAN, WH ;

PANG, SW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (01) :422-426

[3] Released Si microstructures fabricated by deep etching and shallow diffusion [J].

Juan, WH ;

Pang, SW .

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1996, 5 (01) :18-23

[4] Control of etch profile for fabrication of Si microsensors [J].

Juan, WH ;

Pang, SW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (03) :1189-1193

[5] Controlling sidewall smoothness for micromachined Si mirrors and lenses [J].

Juan, WH ;

Pang, SW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4080-4084

[6] High-aspect-ratio Si vertical micromirror arrays for optical switching [J].

Juan, WH ;

Pang, SW .

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1998, 7 (02) :207-213

[7] Silicon fusion bonding and deep reactive ion etching: A new technology for microstructures [J].

Klaassen, EH ;

Petersen, K ;

Noworolski, JM ;

Logan, J ;

Maluf, NI ;

Brown, J ;

Storment, C ;

McCulley, W ;

Kovacs, GTA .

SENSORS AND ACTUATORS A-PHYSICAL, 1996, 52 (1-3) :132-139

[8] DEEP 3-DIMENSIONAL MICROSTRUCTURE FABRICATION FOR INFRARED BINARY OPTICS [J].

STERN, MB ;

MEDEIROS, SS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :2520-2525

[9] ELECTROSTATIC-COMB DRIVE OF LATERAL POLYSILICON RESONATORS [J].

TANG, WC ;

NGUYEN, TCH ;

JUDY, MW ;

HOWE, RT .

SENSORS AND ACTUATORS A-PHYSICAL, 1990, 21 (1-3) :328-331

[10] A merged process for thick single-crystal Si resonators and BiCMOS circuitry [J].

Weigold, JW ;

Wong, AC ;

Nguyen, CTC ;

Pang, SW .

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1999, 8 (03) :221-228

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