共 18 条
[2]
Energy spectra and charge states of debris emitted from laser-produced minimum mass tin plasmas
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2,
2006, 6151
:U1525-U1534
[3]
Extreme ultraviolet lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1998, 16 (06)
:3142-3149
[5]
Enhancement of conversion efficiency of extreme ultraviolet radiation from a liquid aqueous solution microjet target by use of dual laser pulses
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2,
2006, 6151
:U1571-U1578
[7]
EUV radiation characteristics of a CO2 laser produced Xe plasma
[J].
APPLIED PHYSICS B-LASERS AND OPTICS,
2006, 83 (02)
:213-218
[8]
Laser-produced plasma light source development for extreme ultraviolet lithography
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS,
2004, 43 (6B)
:3707-3712
[9]
Laser-produced-plasma light source development for extreme ultraviolet lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
2003, 21 (06)
:2843-2847
[10]
MIYAKE A, 2006, EUTC SOURCE WORKSHOP