Electron-beam chemical lithography with aliphatic self-assembled monolayers

被引：89
作者：
Ballav, Nirmalya [1 ]
Schilp, Soeren [1 ]
Zharnikov, Michael [1 ]
机构：
[1] Heidelberg Univ, Angew Phys Chem, D-69120 Heidelberg, Germany
来源：
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2008年 / 47卷 / 08期
关键词：
electron beams; lithography; monolayers; polymer brushes; self-assembly;
D O I：
10.1002/anie.200704105
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Nanopatterns: The feasibility of a new lithographic technique, chemical lithography with self-assembled monolayers (SAMs) of commercially available aliphatic compounds as resist materials, is demonstrated by the fabrication of polymer nanopatterns (see image). The technique is based on an irradiation-promoted exchange reaction. Patterning requires a much lower dose than electron-beam chemical lithography with aromatic SAMs as resists. (Figure Presented) © 2008 Wiley-VCH Verlag GmbH & Co. KGaA.
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收藏
页码：1421 / 1424
页数：4
相关论文
共 28 条
  • [1] Surface-initiated polymerization on nanopatterns fabricated by electron-beam lithography
    Ahn, SJ
    Kaholek, M
    Lee, WK
    LaMattina, B
    LaBean, TH
    Zauscher, S
    [J]. ADVANCED MATERIALS, 2004, 16 (23-24) : 2141 - +
  • [2] Tuning the exchange reaction between a self-assembled monolayer and potential substituents by electron irradiation
    Ballav, Nirmalya
    Shaporenko, Andrey
    Krakert, Simone
    Terfort, Andreas
    Zharnikov, Michael
    [J]. JOURNAL OF PHYSICAL CHEMISTRY C, 2007, 111 (21) : 7772 - 7782
  • [3] A flexible approach to the fabrication of chemical gradients
    Ballav, Nirmalya
    Shaporenko, Andrey
    Terfort, Andreas
    Zharnikov, Michael
    [J]. ADVANCED MATERIALS, 2007, 19 (07) : 998 - +
  • [4] Fabrication of patterned amine reactivity templates using 4-chloromethylphenylsiloxane self-assembled monolayer films
    Brandow, SL
    Chen, MS
    Aggarwal, R
    Dulcey, CS
    Calvert, JM
    Dressick, WJ
    [J]. LANGMUIR, 1999, 15 (16) : 5429 - 5432
  • [5] Direct measurement of the effect of substrate photoelectrons in x-ray nanolithography
    Carter, DJD
    Pepin, A
    Schweizer, MR
    Smith, HI
    Ocola, LE
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06): : 2509 - 2513
  • [6] Imprint lithography with 25-nanometer resolution
    Chou, SY
    Krauss, PR
    Renstrom, PJ
    [J]. SCIENCE, 1996, 272 (5258) : 85 - 87
  • [7] Eck W, 2000, ADV MATER, V12, P805, DOI 10.1002/(SICI)1521-4095(200006)12:11<805::AID-ADMA805>3.0.CO
  • [8] 2-0
  • [9] PERIODICAL NANOSTRUCTURE FABRICATION USING ELECTRON INTERFERENCE-FRINGES PRODUCED BY SCANNING INTERFERENCE ELECTRON-MICROSCOPE
    FUJITA, S
    MARUNO, S
    WATANABE, H
    KUSUMI, Y
    ICHIKAWA, M
    [J]. APPLIED PHYSICS LETTERS, 1995, 66 (20) : 2754 - 2756
  • [10] Electron-induced crosslinking of aromatic self-assembled monolayers:: Negative resists for nanolithography
    Geyer, W
    Stadler, V
    Eck, W
    Zharnikov, M
    Gölzhäuser, A
    Grunze, M
    [J]. APPLIED PHYSICS LETTERS, 1999, 75 (16) : 2401 - 2403
123