CrB2 coatings deposited by inductively coupled plasma assisted DC magnetron sputtering

被引：23

作者：

Choi, H. S. ^{[1
]}

Park, B. ^{[1
]}

Lee, J. J. ^{[1
]}

机构：

[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151742, South Korea

来源：

SURFACE & COATINGS TECHNOLOGY | 2007年 / 202卷 / 4-7期

关键词：

ICP (inductively coupled plasma); CrB2 (chromuim diboride); plasma nitriding;

D O I：

10.1016/j.surfcoat.2007.06.020

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

CrB2 coatings were synthesized on high speed steel (HSS) substrates using inductively coupled plasma (ICP) assisted DC magnetron sputtering, and the structure and properties of the CrB2 coating produced at different ICP powers and substrate biases were investigated. The hardness of the CrB2 coatings increased from 30 GPa to 54 GPa by increasing the ICP power as well as the negative substrate bias. By increasing ICP power, the preferred orientation of the CrB2 coating changed from (101) to (001). The CrB2 coating showed excellent corrosion resistance. The corrosion resistance of the CrB2 coatings was also found to be much better than that of the TiB2 coatings. The adhesion strength of the film could be improved considerably after ICP nitriding of the substrate. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：982 / 986

页数：5

共 15 条

[1] The effect of pulsed magnetron sputtering on the structure and mechanical properties of CrB2 coatings [J].

Audronis, M. ;

Leyland, A. ;

Kelly, P. J. ;

Matthews, A. .

SURFACE & COATINGS TECHNOLOGY, 2006, 201 (07) :3970-3976

[2] Microstructure of direct current and pulse magnetron sputtered Cr-B coatings [J].

Audronis, M. ;

Kelly, P. J. ;

Leyland, A. ;

Matthews, A. .

THIN SOLID FILMS, 2006, 515 (04) :1511-1516

[3] A TEM study of the structure of magnetron sputtered chromium diboride coatings [J].

Audronis, M. ;

Kelly, P. J. ;

Leyland, A. ;

Matthews, A. .

EMAG-NANO 2005: IMAGING, ANALYSIS AND FABRICATION ON THE NANOSCALE, 2006, 26 :355-+

[4] Pulsed magnetron sputtering of chromium boride films from loose powder targets [J].

Audronis, M ;

Kelly, PJ ;

Arnell, RD ;

Valiulis, AV .

SURFACE & COATINGS TECHNOLOGY, 2006, 200 (14-15) :4166-4173

[5] FAILURE MODES IN SCRATCH ADHESION TESTING [J].

BULL, SJ .

SURFACE & COATINGS TECHNOLOGY, 1991, 50 (01) :25-32

[6] Magnetron sputter deposition of chromium diboride coatings [J].

Dahm, KL ;

Jordan, LR ;

Haase, J ;

Dearnley, PA .

SURFACE & COATINGS TECHNOLOGY, 1998, 108 (1-3) :413-418

[7] FUNDAMENTAL PROPERTIES AND WEAR-RESISTANCE OF RF-SPUTTERED TIB2 AND TI(B,N) COATINGS [J].

HERR, W ;

MATTHES, B ;

BROSZEIT, E ;

KLOOS, KH .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 140 :616-624

[8] CrB2 Schottky barrier contacts on n-GaN [J].

Khanna, R ;

Pearton, SJ ;

Ren, F ;

Kravchenko, I .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (11) :G804-G807

[9]

LARRY R, 2005, CORROS SCI, V47, P1091

[10] Mechanical properties of titanium nitride coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering [J].

Lim, JW ;

Park, HS ;

Park, TH ;

Lee, JJ ;

Joo, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (02) :524-528

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