Periodic layered structure in Ni3Si/Zn diffusion couples

被引：25

作者：

He, Meng ^{[1
]}

Su, Xuping ^{[1
,1
]}

Yin, Fucheng ^{[1
]}

Wang, Jianhua ^{[1
]}

Li, Zhi ^{[1
]}

机构：

[1] Xiangtan Univ, Key Lab Mat Design & Preparat Technol Hunan Provi, Hunan 411105, Peoples R China

来源：

SCRIPTA MATERIALIA | 2008年 / 59卷 / 04期

基金：

中国国家自然科学基金;

关键词：

periodic layered structure; ternary diffusion couples; reactive diffusion zone;

D O I：

10.1016/j.scriptamat.2008.04.015

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

During the reaction in Ni3Si/Zn ternary diffusion couples at temperatures between 390 and 450 degrees C the formation of a periodic layered structure was observed. The periodic layered structure was determined by using scanning electron microscopy coupled with energy dispersive X-ray spectroscopy and X-ray diffraction. It consists of parallel alternating layers: a ternary phase T (Ni(2)Zn(3)si) layer and the gamma (NiZn3) phase layer. A model describing the formation of such a layered structure in the Ni3Si/Zn system is presented. (C) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

引用

页码：411 / 413

页数：3

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