Photolurninescence investigation of Be-doped Npn AlGaAs/GaAs heterojunction bipolar transistor structures

被引:1
作者
Shang, XZ [1 ]
Niu, PJ
Guo, WL
Wang, WX
Huang, Q
Zhou, JM
机构
[1] Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China
[2] Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R China
关键词
heterojunction bipolar transistors; molecular beam epitaxy; Be outdiffusion; photoluminescence;
D O I
10.1016/j.physe.2005.07.014
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Highly complex Npn AlGaAs/GaAs single heterojunction bipolar transistor (HBT) layers with Be-doped base were investigated by photoluminescence (PL) spectroscopy. Room temperature PL shows only a broad peak of GaAs due to thermalization; 15 K PL shows five peaks. The peak at similar to 1.481 eV is from a p-type GaAs base, that at similar to 1.517 eV is from a low-doped GaAs layer and that at similar to 1.55 eV is from a high-doped GaAs collector. The that at similar to 1.849eV is due to bound exciton recombination in an AlGaAs emitter, and that at similar to 1.828 eV is due to the acceptor-related transition from the AlGaAs layer. The integrated intensity ratio of these two peaks can be Used to investigate the Be outdiffusion behavior. thus optimizing the growth conditions of base. The DC current gain of the HBT structure with different growth conditions was found to be in good agreement with the PL results. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:36 / 40
页数:5
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