Gas cluster ion beams for wafer processing

被引：8

作者：

Mack, ME ^{[1
]}

机构：

[1] Ep Corp, Billerica, MA 01821 USA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2005年 / 237卷 / 1-2期

关键词：

cluster ion beams; GCIB; equipment for GCIB;

D O I：

10.1016/j.nimb.2004.12.139

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Gas cluster ion beams (GCIB) represent a powerful new tool for wafer processing. This paper will review the development status of GOB equipment as pertains to semiconductor applications. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：235 / 239

页数：5