Advanced photomask repair technology for 65nm lithography (3)

被引：2

作者：

Itou, Y ^{[1
]}

Tanaka, Y ^{[1
]}

Sugiyama, Y ^{[1
]}

Hagiwara, R ^{[1
]}

Takahashi, H ^{[1
]}

Takaoka, O ^{[1
]}

Kozakai, T ^{[1
]}

Matsuda, O ^{[1
]}

Suzuki, K ^{[1
]}

Okabe, M ^{[1
]}

Kikuchi, S ^{[1
]}

Uemoto, A ^{[1
]}

Yasaka, A ^{[1
]}

Adachi, T ^{[1
]}

Nishida, N ^{[1
]}

机构：

[1] Semicond Leading Edge Technol Inc, Tsukuba, Ibaraki 3058569, Japan

来源：

Photomask and Next-Generation Lithography Mask Technology XII, Pts 1 and 2 | 2005年 / 5853卷

关键词：

65nm generation; 157nm lithography; 193nm lithography; FIB repair system; EB repair system;

D O I：

10.1117/12.617344

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The 65nm photomasks have to meet tight specifications and improve the production yield due to high production cost The 65nm optical lithography was thought to have two candidates, 157nm and 193nm However, at the advent of immersion lithography, it is certain that 193nm lithography will be adopted Therefore, we decided to develop the FIB machine, SIR7000FIB, proior to the EB machine. We optimized repair conditions of FIB system, SIR7000FIB, and evaluated this system. First, we demonstrated minute defect repair using about 15nm defect mask. Then, we confirmed that the repeatability of repair accuracy was below 7nm on a MoSi Hr mask patterned 360nm and 260nm L&S patterns with opaque and clear defects by AFM. Consequently, we have achieved the target specifications of this system.

引用

页码：1000 / 1008

页数：9

共 8 条

[1] Advanced FIB mask repair technology for ArF lithography (3)
Hagiwara, R
Yasaka, A
Takaoka, O
Kozakai, T
Yabe, S
Koyama, Y
Muramatsu, M
Doi, T
Suzuki, K
Okabe, M
Aita, K
Adachi, T
Kubo, S
Yoshioka, N
Morimoto, H
Morikawa, Y
Iwase, K
Hayashi, N
[J]. PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VIII, 2001, 4409 : 555 - 562
[2] HAGIWARA R, 2002, SPIE, V4889, P1056
[3] HAGIWARA R, 2003, SPIE, V5130, P510
[4] Advanced FIB mask repair technology for ArF lithography
Hiruta, K
Kubo, S
Morimoto, H
Yasaka, A
Hagiwara, R
Adachi, T
Morikawa, Y
Iwase, K
Hayashi, N
[J]. PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VII, 2000, 4066 : 523 - 530
[5] ITOH Y, 2004, SPIE, V5446, P301
[6] ITOU Y, 2004, SPIE, V5567, P1132
[7] KUBO S, 2001, SPIE, V4186, P158
[8] TANAKA Y, 2003, SPIE, V5256, P526

← 1 →