Direct patterning, Conformal coating, and erbium doping of luminescent nc-Si/SiO2 thin films from solution processable hydrogen silsesquioxane

被引：37
作者：
Hessel, Colin M.
Summers, Mark A.
Meldrum, Al
Malac, Marek
Veinot, Jonathan G. C. [1 ]
机构：
[1] Univ Alberta, Dept Chem, Edmonton, AB T6G 2G2, Canada
[2] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2V4, Canada
[3] Univ Alberta, Dept Phys, Edmonton, AB T6G 2J1, Canada
[4] Natl Nanotechnol, Edmonton, AB T6G 2M9, Canada
来源：
ADVANCED MATERIALS | 2007年 / 19卷 / 21期
关键词：
D O I：
10.1002/adma.200700731
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Hydrogen silsesquioxane is used as a solution-borne molecular precursor in the fabrication of highly luminescent thin films of SiO2 containing silicon nanocrystals. Films are readily formed on non-flat substrates (e.g., optical fibers) and patterned using e-beam lithography (see figure).
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收藏
页码：3513 / +
页数：5
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