Use of surfactants to tailor the morphologies and crystalline phases of thin films via aerosol assisted chemical vapor deposition

被引：3

作者：

Hussain, Raja Azadar ^{[1
]}

Hussain, Iqtadar ^{[2
]}

机构：

[1] Quaid I Azam Univ, Dept Chem, Islamabad 45320, Pakistan

[2] Qatar Univ, Dept Math Stat & Phys, Doha 2713, Qatar

来源：

JOURNAL OF SOLID STATE CHEMISTRY | 2020年 / 288卷 / 288期

关键词：

AACVD; Surfactants; Thin films; Morphology; SINGLE-SOURCE PRECURSORS; X-RAY STRUCTURES; SULFIDE NANOPARTICLES; FABRICATION; AACVD; CVD; GROWTH; HYDROGEN; METAL; TRANSPARENT;

D O I：

10.1016/j.jssc.2020.121429

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

Morphological control is important for band gap tuning which in turn plays a vital role in device applications. In this article we have reviewed the effect of addition of surfactants (tetraoctylammonium bromide, cetyl-trimethylammonium bromide, Triton X-100, span, tetraoctylphosphonium bromide, sodium dodecyl sulfate, tween, oleylamine, acetylacetone and tetrahydrothiophene) during aerosol assisted chemical vapor deposition of iron selenide thin films, gold nanoparticles in vanadium dioxide matrix, zinc oxide thin films, lead sulfide thin films and gold (0) plate growth. We have also discussed the mechanism of thin film formation.

引用

页数：13

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