LPP Source System Development for HVM

被引：16

作者：

Brandt, David C. ^{[1
]}

Fomenkov, Igor V. ^{[1
]}

Ershov, Alex I. ^{[1
]}

Partlo, William N. ^{[1
]}

Myers, David W. ^{[1
]}

Sandstrom, Richard L. ^{[1
]}

La Fontaine, Bruno ^{[1
]}

Lercel, Michael J. ^{[1
]}

Bykanov, Alexander N. ^{[1
]}

Boewering, Norbert R. ^{[1
]}

Vaschenko, Georgiy O. ^{[1
]}

Khodykin, Oleh V. ^{[1
]}

Srivastava, Shailendra N. ^{[1
]}

Ahmad, Imtiaz ^{[1
]}

Rajyaguru, Chirag ^{[1
]}

Das, Palash ^{[1
]}

Fleurov, Vladimir B. ^{[1
]}

Zhang, Kevin ^{[1
]}

Golich, Daniel J. ^{[1
]}

De Dea, Silvia ^{[1
]}

Hou, Richard R. ^{[1
]}

Dunstan, Wayne J. ^{[1
]}

Wittak, Christian J. ^{[1
]}

Baumgart, Peter ^{[1
]}

Ishihara, Toshi ^{[1
]}

Simmons, Rod D. ^{[1
]}

Jacques, Robert N. ^{[1
]}

Bergstedt, Robert A. ^{[1
]}

机构：

[1] Cymer Inc, San Diego, CA 92127 USA

来源：

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY II | 2011年 / 7969卷

关键词：

EUV source; EUV lithography; Laser Produced Plasma;

D O I：

10.1117/12.882208

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light sources to support optical imaging of circuit features at sub-22nm nodes on the ITRS roadmap. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from leading scanner manufacturers. The status of first generation High Volume Manufacturing (HVM) sources in production and at a leading semiconductor device manufacturer is discussed. The EUV power at intermediate focus is discussed and the lastest data are presented. An electricity consumption model is described, and our current product roadmap is shown.

引用

页数：8

共 7 条

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