Studies on high electronic energy deposition in transparent conducting indium tin oxide thin films

被引:10
作者
Deshpande, N. G. [1 ]
Gudage, Y. G. [1 ]
Ghosh, A. [1 ]
Vyas, J. C. [2 ]
Singh, F. [3 ]
Tripathi, A. [3 ]
Sharma, Ramphal [1 ]
机构
[1] Dr Babasaheb Ambedkar Marathwada Univ, Dept Phys, Thin Film & Nanotechnol Lab, Aurangabad 431004, Maharashtra, India
[2] Bhabha Atom Res Ctr, Tech & Prototype Engn Div, Bombay, Maharashtra, India
[3] Inter Univ Accelerator Ctr, New Delhi 110067, India
关键词
D O I
10.1088/0022-3727/41/3/035308
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have examined the effect of swift heavy ions using 100 MeV Au8+ ions on the electrical properties of transparent, conducting indium tin oxide polycrystalline films with resistivity of 0.58 x 10(-4) Omega cm and optical transmission greater than 78% (pristine). We report on the modifications occurring after high electronic energy deposition. With the increase in fluency, x-ray line intensity of the peaks corresponding to the planes (1 1 0), (4 0 0), (4 4 1) increased, while (3 3 1) remained constant. Surface morphological studies showed a pomegranate structure of pristine samples, which was highly disturbed with a high dose of irradiation. For the high dose, there was a formation of small spherical domes uniformly distributed over the entire surface. The transmittance was seen to be decreasing with the increase in ion fluency. At higher doses, the resistivity and photoluminescence intensity was seen to be decreased. In addition, the carrier concentration was seen to be increased, which was in accordance with the decrease in resistivity. The observed modifications after high electronic energy deposition in these films may lead to fruitful device applications.
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页数:6
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