Magnetostrictive Properties of Amorphous TbFe/FeB Multi layer Thin Films by DC Magnetron Sputtering

被引:0
|
作者
Wang, Wei [1 ]
Mi, Yiming [1 ]
Qian, Shiqiang [1 ]
Zhou, Xiying [1 ]
机构
[1] Shanghai Univ Engn Sci, Sch Mat Engn, Shanghai 201620, Peoples R China
关键词
MULTILAYERS;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Magnetostrictive multilayer films which consists of amorphous TbFe and FeB were prepared by dc magnetron sputtering onto glass substrates. The structure, magnetic and magnetostrictive properties of TbFe/FeB multilayer thin films were investigated at different annealing temperatures. The results reveal that the soft magnetic and magnetostrictive properties for TbFe/FeB multilayer thin films compared to TbFe single layer thin films were obviously improved. In comparison to the intrinsic coercivity H-J(c), of 59.2 kA/m for TbFe single layer thin films, the intrinsic coercivity H-J(c), for TbFe/FeB multilayer thin films rapidly drops to 27.3 kA/m. After annealing at 350 degrees C for 60 min, the maximum saturation magnetostrictive coefficient of lambda(s) = 410x10(-6) was obtained. The best low-field magnetostrictive coefficient could reach to 177x10(-6) under 40 kA/m external magnetic field for the TbFe/FeB multilayer thin films after annealing at 250 degrees C for 60 min.
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页码:1124 / 1125
页数:2
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