Bias voltage effect on the structure and property of chromium copper-diamond-like carbon multilayer films fabricated by cathodic arc plasma

被引：22

作者：

Jao, Jui-Yun ^{[1
]}

Han, Sheng ^{[2
]}

Chang, Li-Shin ^{[1
]}

Chang, Chi-Lung ^{[3
]}

Liu, Yu-Ching ^{[1
]}

Shih, Han C. ^{[1
,4
]}

机构：

[1] Natl Chung Hsing Univ, Dept Mat Sci & Engn, Taichung 402, Taiwan

[2] Natl Taichung Inst Technol, Dept Leisure & Recreat Management, Taichung 404, Taiwan

[3] MingDao Univ, Dept Mat Sci & Engn, Changhua 523, Taiwan

[4] Chinese Culture Univ, Inst Mat Sci & Nanotechnol, Taipei 111, Taiwan

来源：

APPLIED SURFACE SCIENCE | 2010年 / 256卷 / 24期

关键词：

Diamond-like carbon; TEM; Cathodic arc evaporation; Multilayer; AMORPHOUS-CARBON; THIN-FILMS; COATINGS; EVAPORATION; DEPOSITION; GROWTH; HARD;

D O I：

10.1016/j.apsusc.2010.05.095

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Chromium copper-diamond-like carbon (Cr:Cu)-DLC films were deposited onto silicon and by cathodic arc evaporation process using chromium (Cr) and copper (Cu) target arc sources to provide Cr and Cu in the Me-DLC. Acetylene reactive gases were the carbon source and activated at 180 degrees C at 13 mTorr, and a substrate bias voltage was varied from -50V to -200V to provide the (Cr:Cu)-DLC structure. The structure, interface, and chemical bonding state of the produced film were analyzed by transmission electron microscope (TEM), IR Fourier transform (FTIR) spectra, and X-ray photoelectron spectroscopy (XPS). The results showed that the Cr-containing a-C:H/Cu coatings exhibited an amorphous layer of DLC:Cr layer and a crystalline layer of Cu multilayer structure. The profiles of sp(3)/sp(2) (XPS) ratios corresponded to the change of microhardness profile by varying the pressure of the negative DC bias voltage. These (Cr:Cu)-DLC coatings are promising materials for soft substrate protective coatings. Crown Copyright (C) 2010 Published by Elsevier B.V. All rights reserved.

引用

页码：7490 / 7495

页数：6

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