Integrated micro Pirani gauge based hermetical package monitoring for uncooled VO x bolometer FPAs

被引：28

作者：

Xiao, Bin ^{[1
]}

Dong, Tao ^{[1
]}

Halvorsen, Einar ^{[1
]}

Yang, Zhaochu ^{[1
]}

Zhang, Yulong ^{[2
]}

Hoivik, Nils ^{[1
]}

Gu, Dandan ^{[2
]}

Tran, Nhut Minh ^{[1
]}

Jakobsen, Henrik ^{[1
]}

机构：

[1] Vestfold Univ, Norwegian Ctr Expertise Micro & Nanotechnol, Inst Micro & Nano Technol, N-3103 Tonsberg, Norway

[2] Xiamen Univ, Pen Tung Sah Micronano Technol Res Ctr, Xiamen 361005, Peoples R China

来源：

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2011年 / 17卷 / 01期

基金：

中国国家自然科学基金;

关键词：

Vanadium Oxide; Sensitive Material; Sensitive Layer; Radiation Thermal Conductance; Pirani Gauge;

D O I：

10.1007/s00542-010-1186-6

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper presents the design and fabrication of a micro Pirani gauge using VO (x) as the sensitive material for monitoring the pressure inside a hermetical package for micro bolometer focal plane arrays (FPAs). The designed Pirani gauge working in heat dissipating mode was intentionally fabricated using standard MEMS processing which is highly compatible with the FPAs fabrication. The functional layer of the micro Pirani gauge is a VO (x) thin film designed as a 100 x 200 mu m pixel, suspended 2 mu m above the substrate. By modeling of rarefied gas heat conduction using the Extended Fourier's law, finite element analysis is used to investigate the sensitivity of the pressure gauge. Also the thermal interactions between the micro Pirani gauge and bolometer FPAs are verified. From the fabricated prototype, the measured device TCR is about -0.8% K-1 and the sensitivity about 1.84 x 10(-3) W K-1 mbar(-1).

引用

页码：115 / 125

页数：11

共 23 条

[1] Micromachined uncooled IR bolometer linear array using VO2 thin films [J].

Chen, CH ;

Yi, XJ ;

Zhang, J ;

Xiong, BF .

INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES, 2001, 22 (01) :53-58

[2] Infrared responsivity of uncooled VO2-based thin films bolometer [J].

Chen, CH ;

Yi, XJ ;

Xiong, BF .

ACTA PHYSICA SINICA, 2001, 50 (03) :450-452

[3]

Chen G., 2005, PAPPAL SER MECH ENG

[4]

DONG T, 2009, IEEE P 16 IPFA 6 10, P438, DOI DOI 10.1109/IPFA.2009.5232614

[5]

GONG Y, 2009, SEMICOND OPTOELECTRO, V30, P174

[6]

HE X, 2008, THESIS XIAMEN U XIAM

[7]

Karniadakis G.E, 2005, MICROFLOWS NANOFLOWS

[8]

Lindroos V, 2010, MICRO NANO TECHNOL, pIX

[9] OXIDES WHICH SHOW A METAL-TO-INSULATOR TRANSITION AT THE NEEL TEMPERATURE [J].

MORIN, FJ .

PHYSICAL REVIEW LETTERS, 1959, 3 (01) :34-36

[10] Performance improvements for VOx microbolometer FPAs [J].

Murphy, D ;

Ray, M ;

Wyles, J ;

Asbrock, J ;

Hewitt, C ;

Wyles, R ;

Gordon, E ;

Sessler, T ;

Kennedy, A ;

Baur, S ;

Van Lue, D ;

Anderson, S ;

Chin, R ;

Gonzalez, H ;

Le Pere, C ;

Ton, S ;

Kostrzewa, T .

INFRARED TECHNOLOGY AND APPLICATIONS XXX, 2004, 5406 :531-540

← 1 2 3 →