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Structural properties of epitaxial SrCuO2 thin films on SrTiO3 (001) substrates
被引:6
|作者:
Mi, Shao-Bo
[1
,2
]
机构:
[1] Forschungszentrum Julich GmbH, Inst Festkorperforsch, D-52425 Julich, Germany
[2] Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
关键词:
Thin films;
Interface structure;
Transmission electron microscopy;
Strontium copper oxide;
Sputtering;
D O I:
10.1016/j.tsf.2010.10.047
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Thin films of SrCuO2 with tetragonal structure have been epitaxially grown on SrTiO3 (001) substrates by high-oxygen pressure sputtering technique. The interface structure between SrCuO2 and SrTiO3 and configuration of defects in SrCuO2 thin films have been characterized by means of high-resolution transmission electron microscopy. Two types of film-substrate interface structure coexist and are determined as bulk-SrO-TiO2-Sr(O) -CuO2-Sr-bulk and bulk-SrO-TiO2-SrO-Sr(O) -CuO2-Sr-bulk. The planar faults with double SrO atomic layers in (100) planes in SrCuO2 thin films are observed, which mainly arise from the coalescence of these two types of film-substrate interface structure. Meanwhile, planar faults in (110) planes are observed in thin films and structural models are proposed. (C) 2010 Elsevier B.V. All rights reserved.
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页码:2071 / 2074
页数:4
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