Field emission characteristics of CVD diamond coated copper field emitters

被引：0

作者：

Xie, KJ ^{[1
]}

Zeng, BQ ^{[1
]}

Yang, ZH ^{[1
]}

机构：

[1] Univ Elect Sci & Technol China, Inst High Energy Elect, Chengdu 610054, Peoples R China

来源：

2000 25TH INTERNATIONAL CONFERENCE ON INFRARED AND MILLIMETER WAVES CONFERENCE DIGEST | 2000年

关键词：

field emitter; diamond film; negative electron affinity; copper; ohmic contacts;

D O I：

10.1109/ICIMW.2000.893056

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The polycrystalline diamond films were synthesized on copper substrate by microwave plasma chemical vapor deposition technique. The field emission characteristics and the electrical characteristics of contacts between metal and diamond film have investigated.

引用

页码：341 / 342

页数：2