Control of the substrate temperature using a triode magnetron sputtering system

被引：7

作者：

Duarte, D. A. ^{[1
,2
]}

Sagas, J. C. ^{[1
,2
]}

Fontana, L. C. ^{[1
]}

da Silva Sobrinho, A. S. ^{[2
]}

Cinelli, M. J. ^{[1
]}

机构：

[1] Santa Catarina State Univ, Plasmas Phys Lab, BR-89223100 Joinville, SC, Brazil

[2] Technol Inst Aeronaut, Plasma Sci & Technol Lab, BR-12228900 Sao Jose Dos Campos, SP, Brazil

来源：

EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS | 2010年 / 52卷 / 03期

基金：

巴西圣保罗研究基金会;

关键词：

PARTICLE BOMBARDMENT; FILM DEPOSITION; TIO2; FILMS; PLASMA; COATINGS; STEEL;

D O I：

10.1051/epjap/2010149

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The bombardment of ions and electrons at the substrate has been studied by varying the magnetic field distribution and the grid-target distance in a triode magnetron sputtering system. The substrate temperature was correlated with the substrate current density and with the type of species bombarding the substrate. The results indicate a possibility to modify and control the bombardment at the substrate surface from predominantly electronic to predominantly ionic, which increases the substrate temperature from 383 K to 473 K, respectively.

引用

页数：4

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