Studies on Wehnelt of electron-beam accelerator

Electron beam can be focused into a small spot with the diameter of only about nanometers theoretically, and easily controlled. It cannot be replaced by any other micro fabrication techniques in mask-making of VLSI (Very Large-Scale Integration) Based on the electron gun of SDS-3 electron beam lithography machine, the concave hyperboloid Wehnelt (oxide-coated cover) of accelerator is discussed. The electron trajectories and potential distribution are given. Electrons from the gun accelerated by a high voltage reached a target of silicon piece(in front of the aperture) via the Welmelt. Finally, spots of electron-beam in the silicon piece and the geometry schematics for Wehnelt of accelerator are given.