Lithography-free, self-aligned inkjet printing with sub-hundred-nanometer resolution

被引:258
作者
Sele, CW
von Werne, T
Friend, RH
Sirringhaus, H
机构
[1] Univ Cambridge, Cavendish Lab, Cambridge CB03 0HE, England
[2] Plast Log Ltd, Cambridge CB4 0FX, England
关键词
D O I
10.1002/adma.200401285
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Direct inkjet printing of sub-100 nm nanoscale gaps, without the need for any high-resolution lithography, is made possible by a novel self-aligned printing method (see Figure). The benefits of this method are demonstrated by fabrication of all-polymer transistor circuits, which exhibit switching speeds at least two orders of magnitude higher than those previously reported for inkjet-printed polymer devices.
引用
收藏
页码:997 / +
页数:6
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