Effects of oxygen partial pressure on packing density and laser damage threshold of TiO2 thin films

被引：23

作者：

Yao, Jianke ^{[1
]}

Fan, Zhengxiu ^{[1
]}

Jin, Yunxia ^{[1
]}

Zhao, Yuanan ^{[1
]}

He, Hongbo ^{[1
]}

Shao, Jianda ^{[1
]}

机构：

[1] Shanghai Inst Opt & Fine Mech, R&D Ctr Opt Thin FIlm Coatings, Shanghai 201800, Peoples R China

来源：

JOURNAL OF APPLIED PHYSICS | 2007年 / 102卷 / 06期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.1063/1.2779243

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

TiO2 films are deposited by electron beam evaporation as a function of oxygen partial pressure. The packing density, refractive index, and extinction coefficient all decrease with the increase of pressure, which also induces the change of the film's microstructure, such as the increase of voids and H2O concentration in the film. The laser-induced damage threshold (LIDT) of the film increases monotonically with the rise of pressure in this experiment. The porous structure and low nonstoichiometric defects absorption contribute to the film's high LIDT. The films prepared at the lowest and the highest pressure show nonstoichiometric and surface-defects-induced damage features, respectively.(C) 2007 American Institute of Physics.

引用

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