Ab initio calculation for the decomposition process of GaN (0001) and (000(1)over-bar) surfaces

被引:13
作者
Suzuki, Hikari [1 ]
Togashi, Rie [1 ]
Murakami, Hisashi [2 ]
Kumagai, Yoshinao [2 ]
Koukitu, Akinori [2 ]
机构
[1] Tokyo Univ Agr & Technol, Dept Appl Chem, Grad Sch Engn, Koganei, Tokyo 1848588, Japan
[2] Tokyo Univ Agr & Technol, Div Appl Chem, Inst Symbiot Sci & Technol, Koganei, Tokyo 1848588, Japan
关键词
computer simulation; desorption; surface processes; vapor phase epitaxy; nitrides; semiconducting gallium compounds;
D O I
10.1016/j.jcrysgro.2007.11.167
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The activation energies for Ga and N desorption from a GaN surface were calculated using the density functional theory to understand the decomposition process of the GaN(0 0 0 1) and (0 0 0 (1) over bar) Ga- and N-terminated surfaces under a hydrogen atmosphere. It was found that the Ga atoms on the GaN(0 0 0 1) Ga and (0 0 0 (1) over bar) Ga surfaces desorbed as GaH molecules from the surface and the Ga desorption energy for a GaN(0 0 0 1) surface was smaller than that for a GaN(0 0 0 1) surface. In the case of N-terminated surfaces, the N atoms on the GaN(0 0 0 (1) over bar) N and (0 0 0 1) N surfaces desorbed as NH3 molecules from the surface and the N desorption energy for a GaN(0 0 0 1) surface was smaller than that for a GaN(0 0 0 (1) over bar) surface. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:1632 / 1636
页数:5
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