Photoelectron spectroscopy of electronic surface structure of the Cs/GaN and Cs/InN interfaces

被引:3
作者
Timoshnev, Sergei [1 ]
Benemanskaya, Galina [2 ]
Iluridze, Georgi [3 ]
Minashvili, Tamaz [3 ]
机构
[1] Alferov Univ, Lab Nanoelect, St Petersburg 194021, Russia
[2] RAS, Div Solid State Phys, Ioffe Inst, St Petersburg 194021, Russia
[3] Georgian Tech Univ, Dept Phys, GE-0175 Tbilisi, Georgia
关键词
electronic structure; III-nitrides; metal-III-nitride interfaces; photoelectron spectroscopy; surface states; LIGHT-EMITTING-DIODES; CS ADSORPTION; PHOTOEMISSION; INN; GAN; STATES; FILMS; BAND; RICH;
D O I
10.1002/sia.6801
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The electronic structure of the epitaxial GaN, InN nanolayers, and the ultrathin Cs/GaN and Cs/InN interfaces was investigated under ultrahigh vacuum at various Cs coverages. The experiment was carried out using synchrotron-based photoelectron spectroscopy. The photoemission spectra of the valence band and the In 4d, N 2s, Ga 3d, and Cs 4d semicore levels were studied as a function of Cs coverages. It was found that the Cs adsorption in the submonolayer coverage region causes substantial changes in the spectra due to charge transfer between the Cs adlayer and surface Ga or In atoms. The strong interaction of the dangling bonds of Ga or In with Cs adatoms effectively increases the Ga or In valency.
引用
收藏
页码:620 / 625
页数:6
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