Measurement of the Thickness and Refractive Index of a Thin Film Using a Double-slit Experiment

被引:1
|
作者
Kim, Hee Sung [1 ]
Prak, Soobong [1 ,2 ]
Kim, Deok Woo [1 ,2 ]
Kim, Byoung Joo [1 ]
Cha, Myoungsik [1 ]
机构
[1] Pusan Natl Univ, Dept Phys, Pusan 46241, South Korea
[2] Korea Adv Inst Sci & Technol, Daejeon 34141, South Korea
关键词
Diffraction; Double-slit experiment; Refractive index; Thickness measurement; Thin film;
D O I
10.3807/KJOP.2022.33.4.159
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We measured the thickness and refractive index of a thin film using a double-slit diffraction experiment. The amount of phase step in the transmitted light generated by the thin film on the transparent substrate was measured by analyzing the diffraction pattern from the double slits. Experiments were conducted not only in air but also in distilled water, to determine thickness and refractive index simultaneously. To verify the validity of this method, we compared our values for thickness and refractive index to those measured using the well-established waveguide-coupling method. The suggested method is expected to be applied as a new method to simultaneously measure the thickness and refractive index of thin films, along with existing methods.
引用
收藏
页码:159 / 166
页数:8
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