共 26 条
Plasma-assisted self-sharpening of platelet-structured single-crystalline carbon nanocones
被引:85
作者:

Levchenko, I.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia

Ostrikov, K.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia

Long, J. D.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia

Xu, S.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
机构:
[1] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[2] Nanyang Technol Univ, PSAC, NIE, IAS, Singapore 637616, Singapore
基金:
澳大利亚研究理事会;
关键词:
D O I:
10.1063/1.2784932
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
A mechanism and model for the vertical growth of platelet-structured vertically aligned single-crystalline carbon nanostructures by the formation of graphene layers on a flat top surface are proposed and verified experimentally. It is demonstrated that plasma-related effects lead to self-sharpening of tapered nanocones to form needlelike nanostructures, in a good agreement with the predicted dependence of the radius of a nanocone's flat top on the incoming ion flux and surface temperature. The growth mechanism is relevant to a broad class of nanostructures including nanotips, nanoneedles, and nanowires and can be used to improve the predictability of nanofabrication processes.
引用
收藏
页数:3
相关论文
共 26 条
[1]
Growth of vertically aligned carbon nanofibers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition
[J].
Caughman, JBO
;
Baylor, LR
;
Guillorn, MA
;
Merkulov, VI
;
Lowndes, DH
;
Allard, LF
.
APPLIED PHYSICS LETTERS,
2003, 83 (06)
:1207-1209

Caughman, JBO
论文数: 0 引用数: 0
h-index: 0
机构:
Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA

Baylor, LR
论文数: 0 引用数: 0
h-index: 0
机构:
Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA

Guillorn, MA
论文数: 0 引用数: 0
h-index: 0
机构:
Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA

Merkulov, VI
论文数: 0 引用数: 0
h-index: 0
机构:
Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA

Lowndes, DH
论文数: 0 引用数: 0
h-index: 0
机构:
Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA

Allard, LF
论文数: 0 引用数: 0
h-index: 0
机构:
Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA
[2]
Behaviour of oxygen atoms near the surface of nanostructured Nb2O5
[J].
Cvelbar, U.
;
Mozetic, M.
.
JOURNAL OF PHYSICS D-APPLIED PHYSICS,
2007, 40 (08)
:2300-2303

Cvelbar, U.
论文数: 0 引用数: 0
h-index: 0
机构:
Jozef Stefan Inst, Plasma Lab F4, SI-1000 Ljubljana, Slovenia Jozef Stefan Inst, Plasma Lab F4, SI-1000 Ljubljana, Slovenia

Mozetic, M.
论文数: 0 引用数: 0
h-index: 0
机构:
Jozef Stefan Inst, Plasma Lab F4, SI-1000 Ljubljana, Slovenia Jozef Stefan Inst, Plasma Lab F4, SI-1000 Ljubljana, Slovenia
[3]
Ion-assisted precursor dissociation and surface diffusion: Enabling rapid, low-temperature growth of carbon nanofibers
[J].
Denysenko, I.
;
Ostrikov, K.
.
APPLIED PHYSICS LETTERS,
2007, 90 (25)

Denysenko, I.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia

Ostrikov, K.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[4]
Inductively coupled Ar/CH4/H2 plasmas for low-temperature deposition of ordered carbon nanostructures
[J].
Denysenko, IB
;
Xu, S
;
Long, JD
;
Rutkevych, PP
;
Azarenkov, NA
;
Ostrikov, K
.
JOURNAL OF APPLIED PHYSICS,
2004, 95 (05)
:2713-2724

Denysenko, IB
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore

Xu, S
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore

Long, JD
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore

Rutkevych, PP
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore

Azarenkov, NA
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore

Ostrikov, K
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore
[5]
Electronic temperature and density of the plasma produced by nanosecond ultraviolet laser ablation of LiF -: art. no. 181501
[J].
Gordillo-Vázquez, FJ
;
Perea, A
;
Mckiernan, AP
;
Afonso, CN
.
APPLIED PHYSICS LETTERS,
2005, 86 (18)
:1-3

Gordillo-Vázquez, FJ
论文数: 0 引用数: 0
h-index: 0
机构:
Andor Technol Ltd, Belfast BT12 7AL, Antrim, North Ireland Andor Technol Ltd, Belfast BT12 7AL, Antrim, North Ireland

Perea, A
论文数: 0 引用数: 0
h-index: 0
机构:
Andor Technol Ltd, Belfast BT12 7AL, Antrim, North Ireland Andor Technol Ltd, Belfast BT12 7AL, Antrim, North Ireland

Mckiernan, AP
论文数: 0 引用数: 0
h-index: 0
机构:
Andor Technol Ltd, Belfast BT12 7AL, Antrim, North Ireland Andor Technol Ltd, Belfast BT12 7AL, Antrim, North Ireland

Afonso, CN
论文数: 0 引用数: 0
h-index: 0
机构:
Andor Technol Ltd, Belfast BT12 7AL, Antrim, North Ireland Andor Technol Ltd, Belfast BT12 7AL, Antrim, North Ireland
[6]
Low temperature (<100 °C) patterned growth of ZnO nanorod arrays on Si
[J].
Kang, B. S.
;
Pearton, S. J.
;
Ren, F.
.
APPLIED PHYSICS LETTERS,
2007, 90 (08)

Kang, B. S.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA

Pearton, S. J.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA

Ren, F.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[7]
Current-driven ignition of single-wall carbon nanotubes
[J].
Keidar, M
;
Raitses, Y
;
Knapp, A
;
Waas, AM
.
CARBON,
2006, 44 (05)
:1022-1024

Keidar, M
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA

Raitses, Y
论文数: 0 引用数: 0
h-index: 0
机构: Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA

Knapp, A
论文数: 0 引用数: 0
h-index: 0
机构: Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA

Waas, AM
论文数: 0 引用数: 0
h-index: 0
机构: Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA
[8]
Plasma drift and nonuniformity effects in plasma immersion ion implantation
[J].
Keidar, M
;
Monteiro, OR
;
Brown, IG
.
APPLIED PHYSICS LETTERS,
2000, 76 (21)
:3002-3004

Keidar, M
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

Monteiro, OR
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

Brown, IG
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[9]
Magnetic field effect on the sheath thickness in plasma immersion ion implantation
[J].
Keidar, M
;
Monteiro, OR
;
Anders, A
;
Boyd, ID
.
APPLIED PHYSICS LETTERS,
2002, 81 (07)
:1183-1185

Keidar, M
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA

Monteiro, OR
论文数: 0 引用数: 0
h-index: 0
机构: Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA

Anders, A
论文数: 0 引用数: 0
h-index: 0
机构: Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA

Boyd, ID
论文数: 0 引用数: 0
h-index: 0
机构: Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA
[10]
Catalytic growth of single-wall carbon nanotubes: An ab initio study
[J].
Lee, YH
;
Kim, SG
;
Tomanek, D
.
PHYSICAL REVIEW LETTERS,
1997, 78 (12)
:2393-2396

Lee, YH
论文数: 0 引用数: 0
h-index: 0
机构: JEONBUK NATL UNIV,DEPT PHYS,JEONJU 561756,SOUTH KOREA

Kim, SG
论文数: 0 引用数: 0
h-index: 0
机构: JEONBUK NATL UNIV,DEPT PHYS,JEONJU 561756,SOUTH KOREA

Tomanek, D
论文数: 0 引用数: 0
h-index: 0
机构: JEONBUK NATL UNIV,DEPT PHYS,JEONJU 561756,SOUTH KOREA