Band excitation Kelvin probe force microscopy utilizing photothermal excitation

被引：15

作者：

Collins, Liam ^{[1
,2
]}

Jesse, Stephen ^{[3
]}

Balke, Nina ^{[3
]}

Rodriguez, Brian J. ^{[1
,2
]}

Kalinin, Sergei ^{[3
]}

Li, Qian ^{[3
]}

机构：

[1] Univ Coll Dublin, Sch Phys, Dublin 4, Ireland

[2] Univ Coll Dublin, Conway Inst Biomol & Biomed Res, Dublin 4, Ireland

[3] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA

来源：

APPLIED PHYSICS LETTERS | 2015年 / 106卷 / 10期

关键词：

LABEL-FREE; RESOLUTION; NANOSCALE; INTERFACE; CORROSION; DYNAMICS; ARTIFACT; DEVICES;

D O I：

10.1063/1.4913910

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A multifrequency open loop Kelvin probe force microscopy (KPFM) approach utilizing photothermal as opposed to electrical excitation is developed. Photothermal band excitation (PthBE)-KPFM is implemented here in a grid mode on a model test sample comprising a metal-insulator junction with local charge-patterned regions. Unlike the previously described open loop BE-KPFM, which relies on capacitive actuation of the cantilever, photothermal actuation is shown to be highly sensitive to the electrostatic force gradient even at biases close to the contact potential difference (CPD). PthBE-KPFM is further shown to provide a more localized measurement of true CPD in comparison to the gold standard ambient KPFM approach, amplitude modulated KPFM. Finally, PthBE-KPFM data contain information relating to local dielectric properties and electronic dissipation between tip and sample unattainable using conventional single frequency KPFM approaches. (C) 2015 AIP Publishing LLC.

引用

页数：5

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