Growth and Characterization of Cobalt Doped Titanium Dioxide Thin Films by Pulsed Laser Deposition

被引：0

作者：

Hyndman, A. R. ^{[1
]}

Williams, G. V. M. ^{[2
]}

Reeves, R. J. ^{[1
]}

McCann, D. M. ^{[2
]}

机构：

[1] Univ Canterbury, Dept Phys & Astron, Christchurch, New Zealand

[2] Ind Res Ltd, Lower Hutt, New Zealand

来源：

ADVANCED MATERIALS AND NANOTECHNOLOGY, PROCEEDINGS | 2009年 / 1151卷

关键词：

dilute ferromagnetic semiconductor; titanium dioxide; cobalt doped; ferromagnetism; rutile; anatase; FERROMAGNETISM; TIO2; ANATASE;

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Highly oriented rutile and anatase TiO2:Co films have been grown on sapphire and SrTiO3 substrates by pulsed laser deposition with Co concentrations of 3 % and 12 %. All films are transparent with optical gaps >3 eV and show ferromagnetic behavior where the moment per Co ranges from 0.27 mu(B) to 1.2 mu(B). The resistivity shows activated behavior where the activation energy ranges from 67 meV to 79 meV. Our results are consistent with other reports on dilute ferromagnetic TiO2:Co films prepared under similar growth conditions.

引用

页码：137 / +

页数：2

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