Moderately-doped Schottky barriers: a description using thermionic emission over a wide temperature range

被引:3
作者
Li, Ang J. [1 ]
Hebard, Arthur F. [1 ]
机构
[1] Univ Florida, Dept Phys, Gainesville, FL 32611 USA
基金
美国国家科学基金会;
关键词
Schottky barriers; thermionic emission; thermionic field emission; field emission; Schottky barrier tunneling; GALLIUM ARSENIDE; HEIGHT; VOLTAGE; DEPENDENCE; CONTACTS; DIODES; FIELD;
D O I
10.1088/0022-3727/49/45/455101
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on a low temperature study of Schottky barriers between Au, Cr or Al electrodes deposited directly onto moderately-doped Si or GaAs substrates with doping densities in the range 1 x 10(15)-3 x 10(16) cm(-3) and find the unexpected result that for temperatures 5 < T <= 150 K both the zero-voltage Schottky barrier height, Phi(0)(SB)(T) and the reciprocal ideality factor, eta(T)(-1), have linear temperature dependences that extrapolate to zero at T = 0. Accordingly, the thermionic emission equation with these modified temperature-dependent parameters gives a good description of the current-voltage (I-V) characteristics at temperatures where thermionic field emission and field emission (direct tunneling) in addition to thermionic emission are known to be important. Our analysis utilizes a barrier inhomogeneity model to show that the temperature-independent product Phi(0)(SB)(T)eta(T) determined from forward bias characteristics defines a flat band voltage which is shown to be equivalent to the built-in voltage separately determined by extrapolation of capacitance versus voltage measurements made in the reverse bias region.
引用
收藏
页数:8
相关论文
共 28 条
[1]   DOPING DEPENDENCE OF THE SCHOTTKY-BARRIER HEIGHT OF TI-PT CONTACTS TO N-GALLIUM ARSENIDE [J].
BROOM, RF ;
MEIER, HP ;
WALTER, W .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (05) :1832-1833
[2]   EXTRACTION OF SCHOTTKY DIODE PARAMETERS FROM FORWARD CURRENT-VOLTAGE CHARACTERISTICS [J].
CHEUNG, SK ;
CHEUNG, NW .
APPLIED PHYSICS LETTERS, 1986, 49 (02) :85-87
[3]   NORMALIZED THERMIONIC-FIELD (T-F) EMISSION IN METAL-SEMICONDUCTOR (SCHOTTKY) BARRIERS [J].
CROWELL, CR ;
RIDEOUT, VL .
SOLID-STATE ELECTRONICS, 1969, 12 (02) :89-&
[4]   CURRENT-VOLTAGE CHARACTERISTIC OF TI-PSI METAL-OXIDE-SEMICONDUCTOR DIODES [J].
HANSELAER, PL ;
LAFLERE, WH ;
VANMEIRHAEGHE, RL ;
CARDON, F .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (08) :2309-2314
[5]   Hybrid High-Temperature-Superconductor-Semiconductor Tunnel Diode [J].
Hayat, Alex ;
Zareapour, Parisa ;
Zhao, Shu Yang F. ;
Jain, Achint ;
Savelyev, Igor G. ;
Blumin, Marina ;
Xu, Zhijun ;
Yang, Alina ;
Gu, G. D. ;
Ruda, Harry E. ;
Jia, Shuang ;
Cava, J. ;
Steinberg, Aephraim M. ;
Burch, Kenneth S. .
PHYSICAL REVIEW X, 2012, 2 (04)
[6]  
Hübers HW, 1998, J APPL PHYS, V84, P5326, DOI 10.1063/1.368781
[7]   SCHOTTKY-BARRIER ANOMALIES AND INTERFACE STATES [J].
LEVINE, JD .
JOURNAL OF APPLIED PHYSICS, 1971, 42 (10) :3991-+
[8]   The theory of crystal rectifiers [J].
Mott, NF .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1939, 171 (A944) :0027-0038
[9]  
National Research Council (US), 1995, PRUD PRACT LAB HANDL
[10]   ELECTRICAL STUDY OF SCHOTTKY BARRIERS ON ATOMICALLY CLEAN GAAS(110) SURFACES [J].
NEWMAN, N ;
VANSCHILFGAARDE, M ;
KENDELWICZ, T ;
WILLIAMS, MD ;
SPICER, WE .
PHYSICAL REVIEW B, 1986, 33 (02) :1146-1159