Nanoscale thickness double-gated field effect silicon sensors for sensitive pH detection in fluid

被引:27
作者
Elibol, Oguz H. [1 ,2 ]
Reddy, Bobby, Jr. [3 ,4 ]
Bashir, Rashid [3 ,4 ]
机构
[1] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47906 USA
[2] Purdue Univ, Birck Nanotechnol Ctr, Sch Elect & Comp Engn, W Lafayette, IN 47906 USA
[3] Univ Illinois, Micro & Nanotechnol Lab, Urbana, IL 61801 USA
[4] Univ Illinois, Micro & Nanotechnol Lab, Dept Elect & Comp Engn, Urbana, IL 61801 USA
关键词
Field effect semiconductor devices - Gate dielectrics - pH sensors - Silicon on insulator technology;
D O I
10.1063/1.2920776
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, we report on the optimization of a double-gate silicon-on-insulator field effect device operation to maximize pH sensitivity. The operating point can be fine tuned by independently biasing the fluid and the back gate of the device. Choosing the bias points such that device is nearly depleted results in an exponential current response-in our case, 0.70 decade per unit change in pH. This value is comparable to results obtained with devices that have been further scaled in width, reported at the forefront of the field, and close to the ideal value of 1 decade/pH. By using a thin active area, sensitivity is increased due to increased coupling between the two conducting surfaces of the devices. (c) 2008 American Institute of Physics.
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页数:3
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