Passivation evolution of Ti -Ta-Nb medium-entropy sputtered thin films in sulfuric acid solution

被引：27
作者：
Chen, W. Y. [1 ]
Chen, Y. H. [1 ]
Li, W. P. [1 ]
Zhou, Rui [1 ]
Chou, T. H. [1 ]
Wang, X. [3 ]
Huang, J. C. [1 ,2 ]
机构：
[1] City Univ Hong Kong, Hong Kong Inst Adv Study, Dept Mat Sci & Engn, Kowloon, Hong Kong, Peoples R China
[2] Natl Sun Yat Sen Univ, Dept Mat & Optoelect Sci, Kaohsiung 804, Taiwan
[3] Liaoning Shihua Univ, Sch Mech Engn, Fushun 113001, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2022年 / 576卷
关键词：
Titanium; Tantalum; Medium-entropy alloy; Sputtered film; Passive films; CORROSION BEHAVIOR; SURFACE-ANALYSIS; MECHANICAL-PROPERTIES; ALLOYING ADDITIONS; TANTALUM ALLOYS; ZR ALLOY; TITANIUM; BETA; COATINGS; NIOBIUM;
D O I：
10.1016/j.apsusc.2021.151824
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The microstructure and passivation behavior of the Ti-Ta-Nb medium-entropy alloy (MEA) films prepared by sputtering were investigated. The Ti-Ta-Nb MEA films show significantly improved corrosion resistance compared to pure Ti in 0.5 M H2SO4. The mechanisms of the passivation behavior and stability of the passive films were extensively explored and discussed. The passivation evolution phenomenon consisting of two passive regions is due to the variation of chemical compositions of passive films. The excellent corrosion resistance can be ascribed to the stable passive films consisting of the mixture of TiO2/Ti2O3, Ta2O5 and Nb2O5, particularly Ta2O5.
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页数：11
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