Growth, structural, optical and electrical study of ZnS thin films deposited by solution growth technique (SGT)

被引:35
作者
Sadekar, H. K. [1 ,2 ]
Deshpande, N. G. [1 ]
Gudage, Y. G. [1 ]
Ghosh, A. [1 ]
Chavhan, S. D. [1 ]
Gosavi, S. R. [1 ]
Sharma, Ramphal [1 ]
机构
[1] Dr BAM Univ, Dept Phys, Thin Film & Nanotechnol Lab, Aurangabad 431004, Maharashtra, India
[2] Arts Commerce & Sci Coll, Sonai 414105, MS, India
关键词
semiconductor; thin films; chemical synthesis; crystal structure; electronic properties; optical properties; atomic force microscopy (AFM);
D O I
10.1016/j.jallcom.2007.10.123
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
ZnS thin films have been deposited onto glass substrates at temperature 90 degrees C by solution growth technique (SGT). The deposition parameters were optimized. Triethanolamine (TEA) was used as a complexing agent for uniform deposition of the thin films. The elemental composition of the film was confirmed by energy dispersive analysis by X-ray (EDAX) technique. Structure and surface morphology of as-deposited films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM), atomic force microscopy (AFM), respectively. XRD patterns reveal that as-deposited thin films were amorphous in nature; while the obtained precipitate powder was polycrystalline in nature. SEM results revealed that deposited ZnS material has similar to 120 +/- 20 nm average grain size and the spherical grains are distributed over the entire glass substrate. Low surface roughness was found to be 2.7 ran from AFM studies. Transmission spectra indicate a high transmission coefficient (similar to 75%) with direct band gap energy equal to 3.72 eV while indirect band gap was found to be 3.45 eV A photoluminescence (PL) study of the ZnS at room temperature (300 K) indicates a strong luminescence band at energy 2.02 eV. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:519 / 524
页数:6
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