Single-Step Fabrication of High-Throughput Surface-Enhanced Raman Scattering Substrates

The combination of surface-enhanced Raman scattering (SERS) with high-throughput screening (HTS) has significant importance for highly sensitive and massive workload assays. Although fabrication of HTS-SERS substrates can be achieved by several methods, the high cost as well as large-equipment dependence limit their applications. Here, we report a simple method to fabricate HTS-SERS substrates within one-step process. The HTS-SERS substrate is fabricated by simply UV-irradiating a fluoroalkylsilane (FAS)-modified liquid-repellent TiO2 surface in AgNO3 solution through a photomask. Owing to the photocatalytic nature of TiO2, the UV irradiation simultaneously triggers the degradation of the attached FAS and the generation of liquid-adhesive Ag nanoparticles (NPs) on exposed area. A HTS-SERS substrate could be directly obtained after UV irradiation. The deposited Ag NPs evidently enhance Raman signals, and the significant difference between the wettability of exposed area and masked area enables fast formation of high-throughput liquid droplet arrays through a simple dragging solution process. The fabrication method is applicable to various substrate materials, to introduce additional functionalities. The photocatalytic activity of TiO2 also allows us to photobleach the residual analyte and Ag NPs after detection to recycle substrate. This single-step method is a highly promising candidate for the fabrication of HTSSERS substrates.