Circuit design and modeling for soft errors

被引:15
作者
Kleinsowski, A. J. [1 ]
Cannon, Ethan H. [2 ]
Oldiges, Phil [3 ]
Wissel, Larry [2 ]
机构
[1] IBM Austin Res Lab, Div Res, Austin, TX 78758 USA
[2] IBM Syst & Technol Grp, Essex Jct, VT 05452 USA
[3] IBM Corp, Semicond Res & Dev Ctr, Syst & Technol Grp, Hopewell Jct, NY 12533 USA
关键词
D O I
10.1147/rd.523.0255
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
As semiconductor devices decrease in size, soft errors are becoming a major issue that must be addressed at all stages of product definition. Even before prototype silicon chips are available for measuring, modeling must be able to predict soft-error rates with reasonable accuracy. As the technology matures, circuit test sites are produced and experimentally tested to determine representative fail rates of critical SRAM and flip-flop circuits. Circuit models are then fit to these experimental results and further test-site and product circuits are designed and modeled as needed.
引用
收藏
页码:255 / 263
页数:9
相关论文
共 27 条
[1]  
Baumann R. C., 2001, IEEE Transactions on Device and Materials Reliability, V1, P17, DOI 10.1109/7298.946456
[2]   Propagating SET characterization technique for digital CMOS libraries [J].
Baze, M. P. ;
Wert, J. ;
Clement, J. W. ;
Hubert, M. G. ;
Witulski, A. ;
Amusan, O. A. ;
Massengill, L. ;
McMorrow, D. .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2006, 53 (06) :3472-3478
[3]  
BLOME JA, 2005, 1 WORKSH ARCH REL WA
[4]   Fault-tolerant design of the IBM pSeries 690 system using POWER4 processor technology [J].
Bossen, DC ;
Kitamorn, A ;
Reick, KF ;
Floyd, MS .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2002, 46 (01) :77-86
[5]   FINITE-ELEMENT ANALYSIS OF SEMICONDUCTOR-DEVICES - THE FIELDAY PROGRAM [J].
BUTURLA, EM ;
COTTRELL, PE ;
GROSSMAN, BM ;
SALSBURG, KA .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1981, 25 (04) :218-231
[6]   Upset hardened memory design for submicron CMOS technology [J].
Calin, T ;
Nicolaidis, M ;
Velazco, R .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1996, 43 (06) :2874-2878
[7]   SRAM SER in 90,130 and 180 nm bulk and SOI technologies [J].
Cannon, EH ;
Reinhardt, DD ;
Gordon, MS ;
Makowenskyj, PS .
2004 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS, 2004, :300-304
[8]  
DASGUPTA S, 2007, SINGL EV EFF S FEB
[9]  
DRAKE AJ, 2005, 12 NASA S VLSI DES O
[10]  
Friedrich J., 2007, 2007 IEEE International Solid-State Circuits Conference (IEEE Cat. No.07CH37858), P96