Stacking fault in Bi2Te3 and Sb2Te3 single crystals

被引:16
作者
Jariwala, Bhakti [1 ]
Shah, D. V. [1 ]
机构
[1] SV Natl Inst Technol, Dept Appl Phys, Surat, Gujarat, India
关键词
X-ray diffraction; Single crystal growth; Zone melting; Bismuth compounds; Tellurites; Semiconducting materials; QUENCHING PROCESS ROUTE; DISLOCATION LOOPS; TELLURIDE; ENERGY;
D O I
10.1016/j.jcrysgro.2010.10.213
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The structural characterizations of the Bi2Te3 and Sb2Te3 single crystals grown by the Zone melting method have been carried out by XRD and Chemical Etching process. The top free surface of as-grown Bi2Te3 and Sb2Te3 single crystal were observed under optical microscope. The particle size was calculated for a number of reflections using Scherrer's formula by X-ray diffraction method. By the use of XRD data. the growth and deformation fault probability has been estimated for the grown single crystals. The presence of stacking fault in the lattice structure of the grown crystals was verified by the probability of growth and dislocation fault. Also new dislocation etchant has been developed by the successive trial-error method. Dislocation etching was achieved on (1 1 1) crystal plane examined using a saturated solution of citric acid and nitric acid as the etchant. The dislocation etchant has been found to give reproducible etch pits on the cleavage surface for an appropriate etching time 30 s. The use of citric acid and nitric acid proved to be especially advantageous for the basal plane, producing etched pits suitable for dislocation etch pit counting. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:1179 / 1183
页数:5
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