Photoelectric effect at ultrahigh intensities

被引：227

作者：

Sorokin, A. A.

Bobashev, S. V.

Feigl, T.

Tiedtke, K.

Wabnitz, H.

Richter, M.

机构：

[1] Phys Tech Bundesanstalt, D-10587 Berlin, Germany

[2] AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia

[3] Fraunhofer Inst Ang Opt Feinm, D-07745 Jena, Germany

[4] Deutsches Elektronen Synchrontron DESY, D-22603 Hamburg, Germany

来源：

PHYSICAL REVIEW LETTERS | 2007年 / 99卷 / 21期

关键词：

D O I：

10.1103/PhysRevLett.99.213002

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

In the spectral range of the extreme ultraviolet at a wavelength of 13.3 nm, we have studied the photoionization of xenon at ultrahigh intensities. For our ion mass-to-charge spectroscopy experiments, irradiance levels from 10(12) to 10(16) Wcm(-2) were achieved at the new free-electron laser in Hamburg FLASH by strong beam focusing with the aid of a spherical multilayer mirror. Ion charges up to Xe21+ were observed and investigated as a function of irradiance. Our surprising results are discussed in terms of a perturbative and nonperturbative description.

引用

页数：4

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