Surface erosion by moving ion beam

被引：0

作者：

Rudy, A. S. ^{[1
]}

Kulikov, A. N. ^{[2
]}

Bachurin, V. I. ^{[1
]}

机构：

[1] Russian Acad Sci, Valiev Inst Phys & Technol, Yaroslavl Branch, St 21, Yaroslavl 150007, Russia

[2] Yaroslavl State Univ, Sovetskaya St 14, Yaroslavl 150000, Russia

来源：

VACUUM | 2021年 / 193卷

关键词：

Sputtering; Moving ion beam; Boundary value problem; State of equilibrium; Discontinuous solution; PATTERN-FORMATION; RIPPLE FORMATION; SILICON;

D O I：

10.1016/j.vacuum.2021.110504

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A mathematical model of surface erosion in a course of a trench formation by translationally moving ion beam of a Gaussian shape is considered. The solutions obtained in self-similar variables describe the states of equilibrium of the boundary value problem and their dependence on the sputtering parameters. It is shown that there are three parameter areas in which only smooth, smooth and discontinuous and only discontinuous solutions exist. The plots of the surface profiles corresponding to three possible types of solutions are given. Formulas for calculating the profile of etching trenches and examples of calculating profiles corresponding to smooth and discontinuous solutions are given.

引用

页数：9