NEW METHOD OF FABRICATION FRESNEL ZONE PLATE FOR HARD X-RAY RADIATION

被引：1

作者：

Kuyumchyan, A. V. ^{[1
,2
]}

Kuyumchyan, D. A. ^{[3
]}

Aristov, V. V. ^{[1
]}

Shulakov, E. V. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Microelect Technol, Chernogolovka 142432, Russia

[2] Amer NanoSci & Adv Med Equipment INC, Glendale, CA 92545 USA

[3] Riverside Community Coll, Riverside, CA 92506 USA

来源：

NANOENGINEERING: FABRICATION, PROPERTIES, OPTICS, AND DEVICES VII | 2010年 / 7764卷

关键词：

Fresnel zone plate; focusing; hard X-ray radiation; nanomaterials; nanofabrication;

D O I：

10.1117/12.860100

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We present the first results of fabrication the circular zone plate by means of high resolution negative tone inorganic HSQ (Hydrogen Silsesquioxane or XR-1541) electron-beam resist. Fresnel zone plates (FZPs) has been fabricated on the surface of silicon crystals for the energy from 8keV up to 100keV by electron beam lithography. Three different FZPs have been fabricated; circular FZP for the first diffraction order, circular compound FZP for the first and third diffraction order, and linear FZP for the first and second diffraction order. The parameters of the compound FZPs for first and third order were the following: the focal distance of first and third orders FZP is F = 13.229cm for 0.1nm wavelength, the entire aperture is 400.0016 mu m, the width of the outermost zones of the first and third orders is 100nm, and the number of the first and third order zones is 1223.

引用

页数：5

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