Adsorption structure of germanium on the Ru(0001) surface

被引:4
|
作者
Lu, Y. H.
Jia, Y.
Zhang, H. J.
Song, B.
Li, H. Y.
Bao, S. N.
He, P. [1 ]
机构
[1] Zhejiang Univ, Dept Phys, Hangzhou 310027, Peoples R China
[2] Zhengzhou Univ, Sch Phys & Engn, Zhengzhou 450052, Peoples R China
基金
中国国家自然科学基金;
关键词
Ge/Ru growth system; adsorption structure; Ab initio DFT calculation; scanning tunneling microscopy;
D O I
10.1016/j.apsusc.2007.05.084
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Coverage-dependent adsorption energy of the Ge/Ru(0 0 0 1) growth system and the geometrical distortions of the most stable adsorption structure are investigated through first-principles calculations within density functional theory. A local minimum in adsorption energy is found to be at a Ge coverage of 1/7 monolayer with a Ru(0 0 0 1)-root 21 x root 21-3Ge symmetry. Based on this stale superstructure, the scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS) images are simulated by means of surface local-density of states (LDOS). The results are consistent well with the STM measurements on the root 21 x root 21 phase for Ge overlayer on Ru(0 0 0 1). From this stimulation, the relations between the STM images and the lattice distortion are also clarified. (c) 2007 Published by Elsevier B.V.
引用
收藏
页码:431 / 435
页数:5
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