Atomic composition and stability of Langmuir-Blodgett monolayers based on siloxane dimer of quaterthiophene on the surface of polycrystalline gold

被引:3
作者
Komolov, A. S. [1 ]
Lazneva, E. F. [1 ]
Zhukov, Yu. M. [1 ]
Pshenichnyuk, S. A. [1 ,2 ]
Agina, E. V. [3 ]
Dominskii, D. I. [4 ]
Anisimov, D. S. [4 ]
Parashchuk, D. Yu. [4 ]
机构
[1] St Petersburg State Univ, St Petersburg 198504, Russia
[2] Russian Acad Sci, Inst Mol & Crystal Phys, Ufa Res Ctr, Ufa 450075, Bashkortostan, Russia
[3] Russian Acad Sci, Enikolopov Inst Synthet Polymer Mat, Moscow 117393, Russia
[4] Moscow MV Lomonosov State Univ, Dept Phys, Ctr Int Laser, Moscow 119899, Russia
基金
俄罗斯基础研究基金会; 俄罗斯科学基金会;
关键词
FIELD-EFFECT TRANSISTORS; UNOCCUPIED ELECTRONIC STATES; THIN-FILM TRANSISTORS; DEGRADATION PROCESSES; MOLECULAR-STRUCTURE; GRAPHENE; SPECTROSCOPY; SILICON; DERIVATIVES; MICROSCOPY;
D O I
10.1134/S1063783417120228
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Atomic composition of monolayers based on siloxane dimer of quaterthiophene deposited by Langmuir-Blodgett technique on a silicon dioxide surface partially covered by gold film and the stability of these monolayers upon surface treatment by Ar+ ions bombardment have been studied. Experimental results for the chemical composition of a series of studied surfaces have been obtained by X-ray photoelectron spectroscopy (XPS) by recording XPS spectra of C 1s, O 1s, S 2p, and Au 4f core levels. The relative concentration of Au and Si substrate atoms and the composition of ex situ prepared surface under study were determined within 10-15%, which indicates that Langmuir-Blodgett monolayers based on siloxane dimer of quaterthiophene form continuous coating in a considerable extent. Prior to the treatment of the studied surface by Ar+ ions bombardment, carbon- and oxygen-containing surface adsorbates provided a considerable contribution to the results of XPS measurements. The surface cleaning by Ar+ ions with energy 3 keV at electric current through sample of similar to 1 mu A in several 30-s steps has led to the etching of surface adsorbates and next Langmuir-Blodgett films of the siloxane dimer of quaterthiophene.
引用
收藏
页码:2491 / 2496
页数:6
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