Development of sample planning for wafer defect inspection

被引:0
作者
Nagai, T [1 ]
Hamaguchi, A [1 ]
Yamazaki, Y [1 ]
Yamasaki, M [1 ]
Kaga, Y [1 ]
机构
[1] Toshiba Co Ltd, Semicond Co, Proc & Mfg Engn Ctr, Isogo Ku, Yokohama, Kanagawa 2358522, Japan
来源
Characterization and Metrology for ULSI Technology 2005 | 2005年 / 788卷
关键词
sampling plan; defect inspection; gain variation; payback period; principal component analysis;
D O I
暂无
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Sample planning for wafer defect inspection is a critical issue for reducing total cost. It is important to develop a cost-effective sampling plan. In the present study, using three parameters (gain, coefficient of gain variation, and payback period), an optimized sampling plan has been identified by principal component analysis. In particular, a robust sampling plan can be evaluated in terms of a coefficient of gain variation and a cost-effective sampling plan can be evaluated in terms of both gain and the payback period. This indicates that the optimal sampling plan must be designed from both economic and technical viewpoints to reduce the total inspection cost.
引用
收藏
页码:628 / 632
页数:5
相关论文
共 50 条
[21]   Automated defect inspection of concrete structures [J].
Chow, Jun Kang ;
Liu, Kuan-fu ;
Tan, Pin Siang ;
Su, Zhaoyu ;
Wu, Jimmy ;
Li, Zhaofeng ;
Wang, Yu-Hsing .
AUTOMATION IN CONSTRUCTION, 2021, 132
[22]   Simple and accurate optical height sensor for wafer inspection systems [J].
Shimura, Kei ;
Nakai, Naoya ;
Taniguchi, Koichi ;
Itoh, Masahide .
OPTICAL REVIEW, 2016, 23 (01) :1-9
[23]   A novel algorithm for defect inspection of touch panels [J].
Hung, Mao-Hsiung ;
Hsieh, Chaur-Heh .
IMAGE AND VISION COMPUTING, 2015, 41 :11-25
[24]   Defect inspection capability for advanced OPC photomasks [J].
Straub, J ;
Vacca, A ;
Zurbrick, L .
18TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1998, 3546 :454-459
[25]   Defect inspection on CMP process and its application [J].
Noguchi, M ;
Oshima, Y ;
Nishiyama, H ;
Watanabe, K ;
Sugimoto, A .
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIII, PTS 1 AND 2, 1999, 3677 :780-785
[26]   Bearing defect inspection based on machine vision [J].
Shen, Hao ;
Li, Shuxiao ;
Gu, Duoyu ;
Chang, Hongxing .
MEASUREMENT, 2012, 45 (04) :719-733
[27]   Defect Inspection of Copper Bonding Using Ultrasound [J].
Su, Lei ;
Shi, Tielin ;
Du, Li ;
Chen, Pengfei ;
Liao, Guanglan ;
Lu, Xiangning .
2014 15TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY (ICEPT), 2014, :858-861
[28]   Defect Inspection and Defect Size Measurement in a Brazing-typed Heat Exchanger [J].
Seo, Sang-Woo ;
Kim, Jin-Young .
2011 11TH INTERNATIONAL CONFERENCE ON CONTROL, AUTOMATION AND SYSTEMS (ICCAS), 2011, :1031-1034
[29]   Fast yield learning using e-beam wafer inspection [J].
Garvin, J ;
Guldi, R ;
Sridhar, N ;
Tinker, M ;
Cappel, R ;
Cass, T ;
Roberts, J .
MICROELECTRONIC YIELD, RELIABILITY, AND ADVANCED PACKAGING, 2000, 4229 :85-91
[30]   What's in Space - Exploration and Improvement of Line/Space Defect Inspection of Fine-Pitch Redistribution Layer for Fan-Out Wafer Level Packaging [J].
Liebens, M. ;
Slabbekoorn, J. ;
Miller, A. ;
Beyne, E. ;
Yeoh, R. ;
Krah, T. ;
Vangal, A. ;
Hiebert, S. ;
Cross, A. .
2019 30TH ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE (ASMC), 2019,