Development of sample planning for wafer defect inspection

被引:0
|
作者
Nagai, T [1 ]
Hamaguchi, A [1 ]
Yamazaki, Y [1 ]
Yamasaki, M [1 ]
Kaga, Y [1 ]
机构
[1] Toshiba Co Ltd, Semicond Co, Proc & Mfg Engn Ctr, Isogo Ku, Yokohama, Kanagawa 2358522, Japan
来源
Characterization and Metrology for ULSI Technology 2005 | 2005年 / 788卷
关键词
sampling plan; defect inspection; gain variation; payback period; principal component analysis;
D O I
暂无
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Sample planning for wafer defect inspection is a critical issue for reducing total cost. It is important to develop a cost-effective sampling plan. In the present study, using three parameters (gain, coefficient of gain variation, and payback period), an optimized sampling plan has been identified by principal component analysis. In particular, a robust sampling plan can be evaluated in terms of a coefficient of gain variation and a cost-effective sampling plan can be evaluated in terms of both gain and the payback period. This indicates that the optimal sampling plan must be designed from both economic and technical viewpoints to reduce the total inspection cost.
引用
收藏
页码:628 / 632
页数:5
相关论文
共 50 条
  • [1] Wafer Noise Models for Defect Inspection
    Crimmins, Timothy F.
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXV, PT 1 AND PT 2, 2011, 7971
  • [2] Multiple Beam Technology Development & Application for Defect Inspection on EUV wafer/Mask
    Ma, Eric
    Chou, Kevin
    Liu, Xuedong
    Ren, Weiming
    Hu, Xuerang
    Wang, Fei
    PHOTOMASK TECHNOLOGY 2018, 2018, 10810
  • [3] A new strategy for defect inspection by the virtual inspection in semiconductor wafer fabrication
    Pan, Jason Chao-Hsien
    Tai, Damon He
    COMPUTERS & INDUSTRIAL ENGINEERING, 2011, 60 (01) : 16 - 24
  • [4] Filter design methodology for defect detection in wafer inspection
    Socha, Robert J.
    Neureuther, Andrew R.
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1997, 15 (06):
  • [5] Wafer defect inspection by neural analysis of region features
    Chang, Chuan-Yu
    Li, Chun-Hsi
    Chang, Yung-Chi
    Jeng, MuDer
    JOURNAL OF INTELLIGENT MANUFACTURING, 2011, 22 (06) : 953 - 964
  • [6] Wafer defect inspection by neural analysis of region features
    Chuan-Yu Chang
    Chun-Hsi Li
    Yung-Chi Chang
    MuDer Jeng
    Journal of Intelligent Manufacturing, 2011, 22 : 953 - 964
  • [7] WAFER PATTERN DEFECT DETECTION - AN AUTOMATIC INSPECTION TECHNIQUE
    UCHIYAMA, Y
    AWAMURA, D
    NAKASHIMA, K
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 394 : 232 - 238
  • [8] Patterned Wafer Defect Inspection at Advanced Technology Nodes
    Liu Jiamin
    Zhao Hang
    Wu Qizhe
    Feng Xianrui
    Zhao Xiangyu
    Zhang Zhenyang
    Zhang Chumiao
    Huang Tao
    Zhu Jinlong
    Liu Shiyuan
    LASER & OPTOELECTRONICS PROGRESS, 2023, 60 (03)
  • [9] Filter design methodology for defect detection in wafer inspection
    Socha, RJ
    Neureuther, AR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06): : 2718 - 2724
  • [10] Wafer inspection as alternative approach to mask defect qualification
    Holfeld, Christian
    Katzwinkel, Frank
    Seifert, Uwe
    Mothes, Andreas
    Peters, Jan Hendrik
    PHOTOMASK TECHNOLOGY 2007, PTS 1-3, 2007, 6730