Fabrication of self-assembled GaAs/AlGaAs quantum dots by low-temperature droplet epitaxy

被引:23
作者
Lee, CD [1 ]
Park, C
Lee, HJ
Lee, KS
Park, SJ
Park, CG
Noh, SK
Koguchi, N
机构
[1] Korea Res Inst Stand & Sci, Taejon 305600, South Korea
[2] Pohang Univ Sci & Technol, Pohang 790784, South Korea
[3] Elect & Telecommun Res Inst, Taejon 305600, South Korea
[4] Kwangju Inst Sci & Technol, Kwangju 506303, South Korea
[5] Natl Res Inst Met, Tsukuba Labs, Tsukuba, Ibaraki 305, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 12B期
关键词
gallium; gallium arsenide; quantum dots; molecular beam epitaxy; low-temperature growth;
D O I
10.1143/JJAP.37.7158
中图分类号
O59 [应用物理学];
学科分类号
摘要
The fabrication of nanometer-scale GaAs dots on AlGaAs layer by molecular beam epitaxy was demonstrated. Unlike the stress-driven transition of the three-dimensional growth mode in the lattice-mismatched system, the limited migration of Ga droplets on the AlGaAs layer grown at low substrate temperature was exploited to give rise to the formation of three-dimensional GaAs islands. The resulting GaAs dots show crater-like features having {111} facets. In micro-photoluminescence measurements of the buried structures, the emission spectra were clearly observed, and the sharp lines of the spectra might be considered as the exciton emissions from individual dots with various sizes.
引用
收藏
页码:7158 / 7160
页数:3
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