Nanosized CuO encapsulated silica particles using an electrochemical deposition coating

被引:14
作者
Choi, HH [1 ]
Park, J [1 ]
Singh, RK [1 ]
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
关键词
D O I
10.1149/1.1628665
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
An electrochemical deposition coating method was developed to encapsulate submicrometer sized silica particles with nanosized CuO particles. The particle size of the as-synthesized CuO particles was estimated to be below 10 nm from X-ray powder diffraction and transmission electron microscopy (TEM). The thickness of the coating layer measured using TEM ranged from a few nanometers to about 20 nm. The optical absorption spectrum exhibited evidence of formation of CuO nanocrystals with dimensions on the order of a few nanometers as a result of the quantum confinement effect. Zeta potential analysis also proved the presence of CuO coating layer and full surface coverage of the silica particles. (C) 2003 The Electrochemical Society.
引用
收藏
页码:C10 / C12
页数:3
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