Electroanalysis of tetracycline using nickel-implanted boron-doped diamond thin film electrode applied to flow injection system

被引:11
|
作者
Treetepvijit, S
Chuanuwatanakul, S
Einaga, Y
Sato, R
Chailapakul, O [1 ]
机构
[1] Chulalongkorn Univ, Fac Sci, Dept Chem, Bangkok 10330, Thailand
[2] Keio Univ, Fac Sci & Technol, Dept Chem, Yokohama, Kanagawa 2238522, Japan
关键词
D O I
10.2116/analsci.21.531
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
The electrochemical analysis of tetracycline was investigated using nickel-implanted boron-doped diamond thin film electrode by cyclic voltammetry and amperometry with a flow injection system. Cyclic voltammetry was used to study the electrochemical oxidation of tetracycline. Comparison experiments were carried out using as-deposited boron-doped diamond thin film electrode (BDD). Nickel-implanted boron-doped diamond thin film electrode (Ni-DIA) provided well-resolved oxidation irreversible cyclic voltammograms. The current signals were higher than those obtained using the as-deposited BDD electrode. Results using nickel-implanted boron-doped diamond thin film electrode in flow injection system coupled with amperometric detection are presented. The optimum potential for tetracycline was 1.55 V versus Ag/AgCl. The linear range of 1.0 to 100 mu M and the detection limit of 10 nM were obtained. In addition, the application for drug formulation was also investigated.
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页码:531 / 535
页数:5
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