Microlens lithography: A new approach for large display fabrication

被引:6
|
作者
Volkel, R
Herzig, HP
Nussbaum, P
Singer, W
Dandliker, R
Hugle, WB
机构
[1] Institute of Microtechnology, CH-2000 Neuchâtel
关键词
D O I
10.1016/0167-9317(95)00205-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Microlens lithography is a new lithographic method, that uses microlens arrays to image a lithographic mask onto a substrate layer. Microlens lithography provides photolithography at a moderate resolution for an almost unlimited area. The imaging system consists of stacked microlens arrays forming an array of micro-objectives. Each micro-objective images a small part of the mask pattern, the images overlap in the image plane. Potential applications for microlens lithography are the fabrication of large area flat panel displays (FPD), color filters, and micromechanics.
引用
收藏
页码:107 / 110
页数:4
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