Photorefractive lithography with synchrotron light in poly(methyl methacrylate)

被引：4

作者：

Andreas, B ^{[1
]}

Peithmann, K ^{[1
]}

Soergel, E ^{[1
]}

Buse, K ^{[1
]}

机构：

[1] Univ Bonn, Inst Phys, D-53115 Bonn, Germany

来源：

APPLIED PHYSICS LETTERS | 2003年 / 83卷 / 06期

关键词：

D O I：

10.1063/1.1600507

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Synchrotron light changes the refractive index of poly(methyl methacrylate) (PMMA). Refractive-index enhancements as well as reductions depending on dose and energy of the radiation used can be observed. This effect allows the manufacturing of, for example integrated-optical components, as is demonstrated by realization of waveguides in PMMA. (C) 2003 American Institute of Physics.

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页码：1116 / 1118

页数：3

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