Spectral and spatial measurements of a laser-produced plasma EUV source for 13.5 nm based on a double stream Xe/He gas puff target

被引：0

作者：

Rakowski, R. ^{[1
]}

Bartnik, A. ^{[1
]}

Fiedorowicz, H. ^{[1
]}

Jarocki, R. ^{[1
]}

Kostecki, J. ^{[1
]}

Krzywinski, J.

Mikolajczyk, J. ^{[1
]}

Ryc, L.

Szczurek, M. ^{[1
]}

Wachulak, P. ^{[1
]}

机构：

[1] Mil Univ Technol, Inst Optoelect, Warsaw, Poland

来源：

LASERS AND APPLICATIONS | 2005年 / 5958卷

关键词：

laser-produced plasma EUV source; gas puff target; EUV spectroscopy; pinhole camera;

D O I：

10.1117/12.622218

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The results of the spectral and spatial measurements of a laser-produced (LPP) plasma source of extreme ultraviolet (EUV) for 13.5 nm are presented. The double stream Xe/He gas puff target in the source was utilizing. The source was equipped with a Nd: YAG laser system (E = 0.55 J, t = 3.9 ns, f = 10 Hz, M(2) = 2.5) and was dedicated to EUV metrology purposes. An advantage of this approach of the laser-plasma source is a debris free EUV emission. For the spectral research a transmission grating spectrograph (TGS) and a grazing incidence spectrograph (GIS) were utilized. For spatial measurements a pinhole camera was employed. The influence on EUV emission of the laser focal spot position in relation to the gas puff target and the time delays between opening valves and the laser pulse were investigated.

引用

页数：11

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